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https://hdl.handle.net/20.500.14279/1772| Τίτλος: | Nondestructive evaluation of metal contaminated silicon wafers using radiometric measurements | Συγγραφείς: | Kalli, Kyriacos Christofidès, Constantinos Othonos, Andreas S. Tardiff, F. |
metadata.dc.contributor.other: | Καλλή, Κυριάκος | Major Field of Science: | Engineering and Technology | Field Category: | Electrical Engineering - Electronic Engineering - Information Engineering | Λέξεις-κλειδιά: | Semiconductor doping;Silicon;Surface contamination;Nondestructive testing;Photothermal spectroscopy | Ημερομηνία Έκδοσης: | Σεπ-1999 | Πηγή: | Journal of Applied Physics,1999, vol. 86, no. 6, pp. 3064-3067 | Volume: | 86 | Issue: | 6 | Start page: | 3064 | End page: | 3067 | Περιοδικό: | Journal of Applied Physics | Περίληψη: | Metal contaminated silicon wafers were examined using nondestructive methods based on photothermal radiometry. This approach relies on measuring the blackbody radiation emitted from a material excited by a modulated laser source. Information is recovered regarding the electronic and thermal properties of the semiconductor as a function of laser modulation frequency. Data collected as a function of modulation frequency and time show clear distinctions between different samples. The sensitivity to different forms of metallic contamination is examined. | URI: | https://hdl.handle.net/20.500.14279/1772 | ISSN: | 10897550 | DOI: | 10.1063/1.371168 | Rights: | © American Institute of Physics. | Type: | Article | Affiliation: | University of Cyprus LETI (CEA - Technologies Avancées) |
Publication Type: | Peer Reviewed |
| Εμφανίζεται στις συλλογές: | Άρθρα/Articles |
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