Journals Journal of Applied Physics

Name
Journal of Applied Physics
Subjects
Dielectrics
Electrical discharges
Magnetism
Photonics
ISSN
1089-7550
Description
The Journal of Applied Physics (JAP) is an influential international journal publishing significant new experimental and theoretical results of applied physics research.
Impact Factor (2 years)
2.328
Publisher
American Institute of Physics
Journal type
Subscription Journal

Journals Publications
(All)

Results 1-9 of 9 (Search time: 0.002 seconds).

Issue DateTitleAuthor(s)
1Oct-2012Optical and Elastic Properties of Diamond-like Carbon with Metallic Inclusions: a Theoretical StudyTritsaris, Georgios A. ; Kelires, Pantelis C. ; Mathioudakis, Christos 
23-May-2012Intrinsic Stress in ZrN Thin Films: Evaluation of Grain Boundary Contribution From in Situ Wafer Curvature and Ex Situ x-ray Diffraction TechniquesAbadias, Gregory ; Koutsokeras, Loukas E. 
315-Aug-2011Texture and microstructure evolution in single-phase TixTa 1-xN alloys of rocksalt structureAbadias, Gregory ; Patsalas, Panos ; Koutsokeras, Loukas E. 
415-May-2009Structure and electronic properties of conducting, ternary Ti xTa 1-xN filmsMatenoglou, G. M. ; Lekka, Christina E. ; Koutsokeras, Loukas E. ; Karras, Gabriel ; Kosmidis, Constantine E. ; Evangelakis, Georgios Antomiou ; Patsalas, Panos A. 
52008Optical properties, structural parameters, and bonding of highly textured rocksalt tantalum nitride filmsMatenoglou, G. M. ; Lekka, Christina E. ; Koutsokeras, Loukas E. ; Abadias, G. ; Camelio, S. ; Evangelakis, Georgios Antomiou ; Kosmidis, C. ; Patsalas, Panos A. 
613-Oct-2007Recent progress in solution processable organic light emitting devicesChoulis, Stelios A. ; So, Franky ; Krummacher, Benjamin C. 
71-Sep-2006General method to evaluate substrate surface modification techniques for light extraction enhancement of organic light emitting diodesChoulis, Stelios A. ; Krummacher, Benjamin C. ; Mathai, Mathew K. 
815-Mar-2002Characterization of reflectivity inversion, α- and β-phase transitions and nanostructure formation in hydrogen activated thin pd films on silicon based substratesKalli, Kyriacos ; Othonos, Andreas S. ; Christofidès, Constantinos 
9Sep-1999Nondestructive evaluation of metal contaminated silicon wafers using radiometric measurementsKalli, Kyriacos ; Christofidès, Constantinos ; Othonos, Andreas S. ; Tardiff, F.