Please use this identifier to cite or link to this item:
https://hdl.handle.net/20.500.14279/9309
Title: | Composition and stress of SiGe nanostructures on curved substrates |
Authors: | Leontiou, Theodoros Kelires, Pantelis C. |
Major Field of Science: | Engineering and Technology |
Field Category: | Mechanical Engineering |
Keywords: | Nanostructures;Curved substrates |
Issue Date: | 16-Mar-2016 |
Source: | Physical Review B, 2016, vol. 93, no. 12 |
Volume: | 93 |
Issue: | 12 |
Journal: | Physical Review B |
Abstract: | Recent experimental studies of Ge nanoislands on silicon-on-insulator (SOI) substrates have provided a defect-free strain relaxation mechanism through the bending of the substrate. Here, using atomistic Monte Carlo simulations and analytical modeling, we couple this relaxation mechanism with interdiffusion and alloying and observe composition profiles that are completely different from those observed in flat nanoislands. Moreover, for comparable SOI and island thicknesses, intermixing can be greatly reduced and Ge content in the islands is highly preserved. |
URI: | https://hdl.handle.net/20.500.14279/9309 |
ISSN: | 24699969 |
DOI: | 10.1103/PhysRevB.93.125307 |
Rights: | © American Physical Society. |
Type: | Article |
Affiliation : | Frederick University Cyprus University of Technology |
Publication Type: | Peer Reviewed |
Appears in Collections: | Άρθρα/Articles |
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