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  4. Ordering Mechanisms in Epitaxial Sige Nanoislands
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Ordering Mechanisms in Epitaxial Sige Nanoislands

Journal
Physical Review Letters
Date Issued
April 27, 2012
Author(s)
Kelires, Pantelis C.  
Vantarakis, George  
Remediakis, Ioannis N.  
DOI
10.1103/PhysRevLett.108.176102
Abstract
We investigate and elucidate the surprising observation of atomically ordered domains in dome-shaped SiGe nanoislands. We show, through atomistic MonteCarlo simulations, that this ordering is a surface-related phenomenon, and that is driven by surface equilibrium rather than by surface kinetics. The ordering depends on facet orientation. The main source of ordering is the {15323} facet, while the {105} and {113} facets contribute less. Subsurface ordered configurations self-organize under this facet and are frozen-in and buried during island growth, giving rise to the ordered domains. Ordering mechanisms based on constrained surface kinetics, requiring step-mediated segregation at the island facets, are shown to be much less likely.
Subjects

Silicon alloys

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