Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/1520
Title: Temperature-induced reflectivity changes and activation of hydrogen sensitive optically thin palladium films on silicon oxide
Authors: Kalli, Kyriacos 
Othonos, Andreas S. 
Christofidès, Constantinos 
metadata.dc.contributor.other: Καλλή, Κυριάκος
Major Field of Science: Engineering and Technology
Field Category: Electrical Engineering - Electronic Engineering - Information Engineering
Keywords: Palladium;Silicon oxide;Temperature;Hydrogen
Issue Date: 10-Nov-1998
Source: Review of Scientific Instruments, 1998, vol. 69, no. 9, pp. 3331-3338
Volume: 69
Issue: 9
Start page: 3331
End page: 3338
Journal: Review of Scientific Instruments 
Abstract: The optical properties of several thin metal film palladium-silicon oxide structures are examined at room temperature before and after annealing to 200°C and also at 90°C - in all cases in the presence of hydrogen gas. Multicycling sample activation is shown to occur in the presence of hydrogen at room temperature with an increase in reflectivity on exposure to hydrogen, in contrast to thicker 80 Å films. The reflectivity change increases with increasing film thickness (1-10Å). The surface activation at room temperature, before and after annealing to 200°C, is compared with the performance at 90°C, where it is shown that heat treatment strongly influences the behavior of the metal film.
URI: https://hdl.handle.net/20.500.14279/1520
ISSN: 00346748
DOI: 10.1063/1.1149116
Rights: © American Institute of Physics
Type: Article
Affiliation: University of Cyprus 
Affiliation : University of Cyprus 
Linköping Institute of Technology 
Publication Type: Peer Reviewed
Appears in Collections:Άρθρα/Articles

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