Please use this identifier to cite or link to this item:
https://hdl.handle.net/20.500.14279/1456
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kalli, Kyriacos | - |
dc.contributor.author | Othonos, Andreas S. | - |
dc.contributor.author | Tsai, DinPing | - |
dc.date.accessioned | 2013-02-21T13:57:12Z | en |
dc.date.accessioned | 2013-05-17T05:22:40Z | - |
dc.date.accessioned | 2015-12-02T10:05:28Z | - |
dc.date.available | 2013-02-21T13:57:12Z | en |
dc.date.available | 2013-05-17T05:22:40Z | - |
dc.date.available | 2015-12-02T10:05:28Z | - |
dc.date.issued | 2000-07-01 | - |
dc.identifier.citation | Applied Surface Science, 2000, vol. 161, no. 1, pp. 54-60 | en_US |
dc.identifier.issn | 01694332 | - |
dc.identifier.uri | https://hdl.handle.net/20.500.14279/1456 | - |
dc.description.abstract | Optically thin palladium films evaporated on different silicon-based substrates are investigated following exposure to different concentrations of hydrogen gas in air. Laser modulated reflectance off the palladium surface of silicon oxide, silicon nitrite and polycrystalline silicon substrates is used to recover information regarding changes in optical properties of the samples due to the absorption of hydrogen. Simple index of refraction arguments are sufficient to explain the results. Structural changes of the palladium films have been investigated using atomic force microscopy before and after hydrogen exposure. An interesting nanostructure formation is evident in some of the samples, leading to a possible means of fabricating nanodevices. | en_US |
dc.format | en_US | |
dc.language.iso | en | en_US |
dc.relation.ispartof | Applied Surface Science | en_US |
dc.rights | © Elsevier | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
dc.subject | Atomic force microscopy | en_US |
dc.subject | Hydrogen | en_US |
dc.subject | Nanostructured materials | en_US |
dc.subject | Refractive index | en_US |
dc.subject | Refractive index | en_US |
dc.title | Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen | en_US |
dc.type | Article | en_US |
dc.affiliation | University of Cyprus | en |
dc.collaboration | University of Cyprus | en_US |
dc.collaboration | National Taiwan University | en_US |
dc.subject.category | Electrical Engineering - Electronic Engineering - Information Engineering | en_US |
dc.journals | Open Access | en_US |
dc.country | Cyprus | en_US |
dc.country | Taiwan | en_US |
dc.subject.field | Engineering and Technology | en_US |
dc.publication | Peer Reviewed | en_US |
dc.identifier.doi | 10.1016/S0169-4332(00)00140-9 | en_US |
dc.dept.handle | 123456789/54 | en |
dc.relation.issue | 1 | en_US |
dc.relation.volume | 161 | en_US |
cut.common.academicyear | 1999-2000 | en_US |
dc.identifier.spage | 54 | en_US |
dc.identifier.epage | 60 | en_US |
item.grantfulltext | none | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.openairetype | article | - |
item.cerifentitytype | Publications | - |
item.languageiso639-1 | en | - |
item.fulltext | No Fulltext | - |
crisitem.author.dept | Department of Electrical Engineering, Computer Engineering and Informatics | - |
crisitem.author.faculty | Faculty of Engineering and Technology | - |
crisitem.author.orcid | 0000-0003-4541-092X | - |
crisitem.author.parentorg | Faculty of Engineering and Technology | - |
crisitem.journal.journalissn | 0169-4332 | - |
crisitem.journal.publisher | Elsevier | - |
Appears in Collections: | Άρθρα/Articles |
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