Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/1456
DC FieldValueLanguage
dc.contributor.authorKalli, Kyriacos-
dc.contributor.authorOthonos, Andreas S.-
dc.contributor.authorTsai, DinPing-
dc.date.accessioned2013-02-21T13:57:12Zen
dc.date.accessioned2013-05-17T05:22:40Z-
dc.date.accessioned2015-12-02T10:05:28Z-
dc.date.available2013-02-21T13:57:12Zen
dc.date.available2013-05-17T05:22:40Z-
dc.date.available2015-12-02T10:05:28Z-
dc.date.issued2000-07-01-
dc.identifier.citationApplied Surface Science, 2000, vol. 161, no. 1, pp. 54-60en_US
dc.identifier.issn01694332-
dc.identifier.urihttps://hdl.handle.net/20.500.14279/1456-
dc.description.abstractOptically thin palladium films evaporated on different silicon-based substrates are investigated following exposure to different concentrations of hydrogen gas in air. Laser modulated reflectance off the palladium surface of silicon oxide, silicon nitrite and polycrystalline silicon substrates is used to recover information regarding changes in optical properties of the samples due to the absorption of hydrogen. Simple index of refraction arguments are sufficient to explain the results. Structural changes of the palladium films have been investigated using atomic force microscopy before and after hydrogen exposure. An interesting nanostructure formation is evident in some of the samples, leading to a possible means of fabricating nanodevices.en_US
dc.formatpdfen_US
dc.language.isoenen_US
dc.relation.ispartofApplied Surface Scienceen_US
dc.rights© Elsevieren_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/us/*
dc.subjectAtomic force microscopyen_US
dc.subjectHydrogenen_US
dc.subjectNanostructured materialsen_US
dc.subjectRefractive indexen_US
dc.subjectRefractive indexen_US
dc.titleOptically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogenen_US
dc.typeArticleen_US
dc.affiliationUniversity of Cyprusen
dc.collaborationUniversity of Cyprusen_US
dc.collaborationNational Taiwan Universityen_US
dc.subject.categoryElectrical Engineering - Electronic Engineering - Information Engineeringen_US
dc.journalsOpen Accessen_US
dc.countryCyprusen_US
dc.countryTaiwanen_US
dc.subject.fieldEngineering and Technologyen_US
dc.publicationPeer Revieweden_US
dc.identifier.doi10.1016/S0169-4332(00)00140-9en_US
dc.dept.handle123456789/54en
dc.relation.issue1en_US
dc.relation.volume161en_US
cut.common.academicyear1999-2000en_US
dc.identifier.spage54en_US
dc.identifier.epage60en_US
item.grantfulltextnone-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.openairetypearticle-
item.cerifentitytypePublications-
item.languageiso639-1en-
item.fulltextNo Fulltext-
crisitem.author.deptDepartment of Electrical Engineering, Computer Engineering and Informatics-
crisitem.author.facultyFaculty of Engineering and Technology-
crisitem.author.orcid0000-0003-4541-092X-
crisitem.author.parentorgFaculty of Engineering and Technology-
crisitem.journal.journalissn0169-4332-
crisitem.journal.publisherElsevier-
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