1. Ktisis Cyprus University of Technology
  2. Cyprus University of Technology (Research Output)
  3. Άρθρα/Articles
Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/1443
DC FieldValueLanguage
dc.contributor.authorGioti, Maria-
dc.contributor.authorLogothetidis, Stergios D.-
dc.contributor.authorKelires, Pantelis C.-
dc.contributor.otherΚελίρης, Παντελής-
dc.date.accessioned2013-03-05T10:30:31Zen
dc.date.accessioned2013-05-17T05:22:54Z-
dc.date.accessioned2015-12-02T10:13:33Z-
dc.date.available2013-03-05T10:30:31Zen
dc.date.available2013-05-17T05:22:54Z-
dc.date.available2015-12-02T10:13:33Z-
dc.date.issued1999-
dc.identifier.citationPhysical Review B, 1999, vol. 59, no. 7, pp. 5074-5081en_US
dc.identifier.issn10980121-
dc.identifier.urihttps://hdl.handle.net/20.500.14279/1443-
dc.description.abstractWe study the interfacial properties of thin amorphous carbon films grown on silicon (100) substrates. By combining experimental spectroscopic ellipsometry and stress measurements and theoretical Monte Carlo simulations, we show that significant interdiffusion takes place at the initial stages of growth, driven by a strain mediated mechanism, and we identify the relevant atomistic processes.en_US
dc.formatpdfen_US
dc.language.isoenen_US
dc.relation.ispartofPhysical Review Ben_US
dc.rights© American Physical Societyen_US
dc.subjectHeterostructuresen_US
dc.subjectCarbonen_US
dc.subjectEllipsometryen_US
dc.titleInterfacial stability and atomistic processes in the a-c/si(100) heterostructure systemen_US
dc.typeArticleen_US
dc.affiliationUniversity of Creteen
dc.collaborationUniversity of Creteen_US
dc.collaborationFoundation for Research & Technology-Hellas (F.O.R.T.H.)en_US
dc.collaborationAristotle University of Thessalonikien_US
dc.journalsHybrid Open Accessen_US
dc.countryGreeceen_US
dc.subject.fieldNatural Sciencesen_US
dc.publicationPeer Revieweden_US
dc.identifier.doi10.1103/PhysRevB.59.5074en_US
dc.dept.handle123456789/54en
dc.relation.issue7en_US
dc.relation.volume59en_US
cut.common.academicyear1999-2000en_US
dc.identifier.spage5074en_US
dc.identifier.epage5081en_US
item.fulltextNo Fulltext-
item.cerifentitytypePublications-
item.grantfulltextnone-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.openairetypearticle-
item.languageiso639-1en-
crisitem.journal.journalissn2469-9969-
crisitem.journal.publisherAmerican Physical Society-
crisitem.author.deptDepartment of Mechanical Engineering and Materials Science and Engineering-
crisitem.author.facultyFaculty of Engineering and Technology-
crisitem.author.orcid0000-0002-0268-259X-
crisitem.author.parentorgFaculty of Engineering and Technology-
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