Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/34843
Title: Validated physical models and parameters of bulk 3C-SiC aiming for credible technology computer aided design (TCAD) simulation
Authors: Arvanitopoulos, A. 
Lophitis, Neophytos 
Gyftakis, K. N. 
Perkins, Samuel 
Antoniou, M. 
Major Field of Science: Engineering and Technology
Keywords: silicon carbide;technology computer aided design (TCAD);wide bandgap
Issue Date: 19-Sep-2017
Source: Semiconductor Science and Technology, 2017, vol. 32, no. 10
Volume: 32
Issue: 10
Journal: Semiconductor Science and Technology 
Abstract: The cubic form of SiC (β- or 3C-) compared to the hexagonal α-SiC polytypes, primarily 4H- and 6H-SiC, has lower growth cost and can be grown heteroepitaxially in large area silicon (Si) wafers which makes it of special interest. This in conjunction with the recently reported growth of improved quality 3C-SiC, make the development of devices an imminent objective. However, the readiness of models that accurately predict the material characteristics, properties and performance is an imperative requirement for attaining the design and optimization of functional devices. The purpose of this study is to provide and validate a comprehensive set of models alongside with their parameters for bulk 3C-SiC. The validation process revealed that the proposed models are in a very good agreement to experimental data and confidence ranges were identified. This is the first piece of work achieving that for 3C-SiC. Considerably, it constitutes the necessary step for finite element method simulations and technology computer aided design.
URI: https://hdl.handle.net/20.500.14279/34843
ISSN: 02681242
DOI: 10.1088/1361-6641/aa856b
Type: Article
Affiliation : Coventry University 
University of Cambridge 
Publication Type: Peer Reviewed
Appears in Collections:Άρθρα/Articles

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