Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/18181
DC FieldValueLanguage
dc.contributor.authorKeivanidis, Panagiotis E.-
dc.contributor.authorKhong, Siong Hee-
dc.contributor.authorHo, Peter K.H.-
dc.contributor.authorGreenham, Neil C.-
dc.contributor.authorFriend, Richard H.-
dc.date.accessioned2020-03-27T17:40:30Z-
dc.date.available2020-03-27T17:40:30Z-
dc.date.issued2009-05-11-
dc.identifier.citationApplied Physics Letters, 2009, vol. 94, no. 17en_US
dc.identifier.issn10773118-
dc.identifier.urihttps://hdl.handle.net/20.500.14279/18181-
dc.description.abstractWe present photodiodes fabricated with several layers of semiconducting polymers, designed to show low dark current under reverse bias operation. Dark current minimization is achieved through the presence of additional polymer layers that reduce charge carrier injection in reverse bias, when in contact with the device electrodes. All polymer layers are deposited via spin coating and are photocross-linked for allowing further polymer layer deposition, by using a bis-fluorinated phenyl-azide photocross-linking agent. Dark current density values as low as 40 pA/ mm2 are achieved with a corresponding external quantum efficiency (EQE) of 20% at a reverse bias of -0.5 V when an electron-blocking layer is used. Dark current is further reduced when both an electron- and a hole-blocking layer are used but the EQE falls significantly. © 2009 American Institute of Physics.en_US
dc.formatpdfen_US
dc.language.isoenen_US
dc.relation.ispartofApplied Physics Lettersen_US
dc.rights© American Institute of Physicsen_US
dc.subjectPhotodetectorsen_US
dc.subjectElectric currentsen_US
dc.subjectPhotodiodesen_US
dc.subjectQuantum efficiencyen_US
dc.subjectMaterialsen_US
dc.subjectPhotovoltaicsen_US
dc.subjectSpin coatingen_US
dc.subjectShort circuiten_US
dc.subjectConducting polymersen_US
dc.subjectHeterostructuresen_US
dc.titleAll-solution based device engineering of multilayer polymeric photodiodes: Minimizing dark currenten_US
dc.typeArticleen_US
dc.collaborationCavendish Laboratoryen_US
dc.collaborationNational University of Singaporeen_US
dc.subject.categoryMechanical Engineeringen_US
dc.journalsSubscriptionen_US
dc.countryUnited Kingdomen_US
dc.countrySingaporeen_US
dc.subject.fieldEngineering and Technologyen_US
dc.publicationPeer Revieweden_US
dc.identifier.doi10.1063/1.3120547en_US
dc.identifier.scopus2-s2.0-65449121498-
dc.identifier.urlhttps://api.elsevier.com/content/abstract/scopus_id/65449121498-
dc.relation.issue17en_US
dc.relation.volume94en_US
cut.common.academicyear2008-2009en_US
item.fulltextNo Fulltext-
item.cerifentitytypePublications-
item.grantfulltextnone-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.openairetypearticle-
item.languageiso639-1en-
crisitem.journal.journalissn1077-3118-
crisitem.journal.publisherAmerican Institute of Physics-
crisitem.author.deptDepartment of Mechanical Engineering and Materials Science and Engineering-
crisitem.author.facultyFaculty of Engineering and Technology-
crisitem.author.orcid0000-0002-5336-249X-
crisitem.author.parentorgFaculty of Engineering and Technology-
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