Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/1695
Title: Intrinsic stress and local rigidity in tetrahedral amorphous carbon
Authors: Kelires, Pantelis C. 
metadata.dc.contributor.other: Κελίρης, Παντελής
Major Field of Science: Engineering and Technology
Field Category: Mechanical Engineering
Keywords: Carbon;Chemical structure;System analysis;Energy transfer
Issue Date: 15-Dec-2000
Source: Physical Review B, 2000, vol. 62, no. 23, pp. 15686-15694
Volume: 62
Issue: 23
Start page: 15686
End page: 15694
Journal: Physical Review B 
Abstract: Atomic level quantities are valuable tools in probing the local structural characteristics of amorphous materials. In this paper, we utilize the concept of atomic level stresses to study the problem of intrinsic stress in tetrahedral amorphous carbon. The stresses are extracted from the local energetics, based on the empirical potential approach, while the finite temperature statistics of the system are described by Monte Carlo simulations. We show that contrary to the nonequilibrium as-grown structures that are left intrinsically stressed by the deposition process, equilibrated/annealed films that relax the external constraints and pressure possess zero total intrinsic stress without reduction of the desired high fraction of sp3 sites. We also address in this paper the issue of local rigidity by introducing the concept of local bulk modulus, as a measure of the rigidity contributed by each atomic site. We find that the sp2 sites are not floppy elements in the amorphous network but that they contribute rigidity, although significantly less than the sp3 sites.
URI: https://hdl.handle.net/20.500.14279/1695
ISSN: 10980121
DOI: 10.1103/PhysRevB.62.15686
Rights: © American Physical Society
Type: Article
Affiliation: University of Crete 
Affiliation : University of Crete 
Publication Type: Peer Reviewed
Appears in Collections:Άρθρα/Articles

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