Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/1548
Title: General trends of the carbon penetration in si(001) surfaces
Authors: Tammar, El Mostafa 
Sonnet, Ph 
Kelires, Pantelis C. 
metadata.dc.contributor.other: Κελίρης, Παντελής
Major Field of Science: Engineering and Technology
Field Category: ENGINEERING AND TECHNOLOGY
Keywords: Carbon;Computer simulation;Dimers;Silicon;Adsorption
Issue Date: Jul-2005
Source: Solid State Communications, 2005, vol. 135, no. 1-2, pp. 138-143
Volume: 135
Issue: 1-2
Start page: 138
End page: 143
Journal: Solid State Communications 
Abstract: We present a Monte Carlo study on the general trends of the carbon incorporation in Si(001) surfaces in presence of an increasing number of carbon atoms or surface defects such as silicon or germanium ad-dimers. Our results emphasize two possible ways of improving the carbon penetration in the Si(001) subsurface region: (i) increasing the carbon coverage from a single carbon atom per unit cell to a carbon monolayer; (ii) increasing the number of ad-dimers. Combining both effects leads to an appreciable amelioration of the carbon contents in the subsurface layers. Acting on the ad-dimer location with respect to the silicon dimer rows favours the carbon penetration even further. The influence of other parameters such as the ad-dimer-ad-dimer distance or the chemical nature of the defects (silicon or germanium) is also investigated.
URI: https://hdl.handle.net/20.500.14279/1548
ISSN: 00381098
DOI: 10.1016/j.ssc.2005.03.045
Rights: © Elsevier
Attribution-NonCommercial-NoDerivs 3.0 United States
Type: Article
Affiliation: University of Crete 
Affiliation : University of Crete 
Publication Type: Peer Reviewed
Appears in Collections:Άρθρα/Articles

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