Please use this identifier to cite or link to this item:
https://hdl.handle.net/20.500.14279/1479
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Abadias, Gregory | - |
dc.contributor.author | Koutsokeras, Loukas E. | - |
dc.contributor.author | Guerin, Philippe | - |
dc.contributor.author | Patsalas, Panos A. | - |
dc.date.accessioned | 2013-02-22T13:35:56Z | en |
dc.date.accessioned | 2013-05-17T05:22:44Z | - |
dc.date.accessioned | 2015-12-02T10:06:04Z | - |
dc.date.available | 2013-02-22T13:35:56Z | en |
dc.date.available | 2013-05-17T05:22:44Z | - |
dc.date.available | 2015-12-02T10:06:04Z | - |
dc.date.issued | 2009 | - |
dc.identifier.citation | Thin Solid Films, 2009, vol. 518, no. 5, pp. 1532–1537 | en_US |
dc.identifier.issn | 00406090 | - |
dc.identifier.uri | https://hdl.handle.net/20.500.14279/1479 | - |
dc.description.abstract | Stress evolution during reactive magnetron sputtering of binary TiN, ZrN and TaN thin films as well as ternary Ti–Zr–N and Ti–Ta–N solid-solutions was studied using real-time wafer curvature measurements. The energy of the incoming particles (sputtered atoms, backscattered Ar, ions) was tuned by changing either the metal target (MTi = 47.9, MZr = 91.2 and MTa = 180.9 g/mol), the plasma conditions (effect of pressure, substrate bias or magnetron configuration) for a given target or by combining different metal targets during co-sputtering. Experimental results were discussed using the average energy of the incoming species, as calculated using Monte-Carlo simulations (SRIM code). In the early stage of growth, a rapid evolution to compressive stress states is noticed for all films. A reversal towards tensile stress is observed with increasing thickness at low energetic deposition conditions, revealing the presence of stress gradients. The tensile stress is ascribed to the development of a ‘zone T’ columnar growth with intercolumnar voids and rough surface. At higher energetic deposition conditions, the atomic peening mechanism is predominant: the stress remains largely compressive and dense films with more globular microstructure and smooth surface are obtained | en_US |
dc.format | en_US | |
dc.language.iso | en | en_US |
dc.relation.ispartof | Thin Solid Films | en_US |
dc.rights | © Elsevier | en_US |
dc.subject | Materials science | en_US |
dc.subject | Magnetrons | en_US |
dc.subject | Tin | en_US |
dc.subject | Nitrides | en_US |
dc.subject | Sputtering (Physics) | en_US |
dc.subject | Tanning | en_US |
dc.subject | Titanium compounds | en_US |
dc.title | Stress evolution in magnetron sputtered Ti–Zr–N and Ti–Ta–N films studied by in situ wafer curvature: role of energetic particles | en_US |
dc.type | Article | en_US |
dc.affiliation | University of Ioannina | en |
dc.collaboration | Université de Poitiers | en_US |
dc.collaboration | University of Ioannina | en_US |
dc.subject.category | Materials Engineering | en_US |
dc.journals | Subscription | en_US |
dc.country | France | en_US |
dc.country | Greece | en_US |
dc.subject.field | Engineering and Technology | en_US |
dc.publication | Peer Reviewed | en_US |
dc.identifier.doi | 10.1016/j.tsf.2009.07.183 | en_US |
dc.dept.handle | 123456789/54 | en |
dc.relation.issue | 5 | en_US |
dc.relation.volume | 518 | en_US |
cut.common.academicyear | 2009-2010 | en_US |
dc.identifier.spage | 1532 | en_US |
dc.identifier.epage | 1537 | en_US |
item.languageiso639-1 | en | - |
item.cerifentitytype | Publications | - |
item.fulltext | No Fulltext | - |
item.grantfulltext | none | - |
item.openairetype | article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
crisitem.author.dept | Department of Mechanical Engineering and Materials Science and Engineering | - |
crisitem.author.faculty | Faculty of Engineering and Technology | - |
crisitem.author.orcid | 0000-0003-4143-0085 | - |
crisitem.author.parentorg | Faculty of Engineering and Technology | - |
crisitem.journal.journalissn | 0040-6090 | - |
crisitem.journal.publisher | Elsevier | - |
Appears in Collections: | Άρθρα/Articles |
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