Please use this identifier to cite or link to this item:
https://hdl.handle.net/20.500.14279/1473
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kalli, Kyriacos | - |
dc.contributor.author | Othonos, Andreas S. | - |
dc.contributor.author | Christofidès, Constantinos | - |
dc.contributor.other | Καλλή, Κυριάκος | - |
dc.date.accessioned | 2013-02-22T14:18:34Z | en |
dc.date.accessioned | 2013-05-17T05:22:46Z | - |
dc.date.accessioned | 2015-12-02T10:05:59Z | - |
dc.date.available | 2013-02-22T14:18:34Z | en |
dc.date.available | 2013-05-17T05:22:46Z | - |
dc.date.available | 2015-12-02T10:05:59Z | - |
dc.date.issued | 1998-10-21 | - |
dc.identifier.citation | Review of Scientific Instruments,1998, vol. 69, no. 3, pp. 1505-1511 | en_US |
dc.identifier.issn | 10897623 | - |
dc.identifier.uri | https://hdl.handle.net/20.500.14279/1473 | - |
dc.description.abstract | The sensitivity of various thicknesses of optically thin film palladium layers evaporated onto silicon oxide substrate is investigated in the presence of a hydrogen/air atmosphere at room temperature. The magnitude of the resulting reflectivity change is measured using an excite-probe technique, through laser excited photothermal modulation of a probe beam. This allows for the recovery of information from both the amplitude and phase channels of the hydrogen sensor output. Data indicates that concentrations of 0.1% hydrogen in the presence of a balanced air mixture and at room temperature may be measured with an 8 nm palladium film. The presence of inhomogeneities in the palladium layers leads to anomalous behavior. | en_US |
dc.format | en_US | |
dc.language.iso | en | en_US |
dc.relation.ispartof | Review of Scientific Instruments | en_US |
dc.rights | © American Institute of Physics | en_US |
dc.subject | Photothermal spectroscopy | en_US |
dc.subject | Palladium | en_US |
dc.subject | Hydrogen | en_US |
dc.subject | Chemisorption | en_US |
dc.subject | Silicon oxide | en_US |
dc.title | Photomodulated thermoreflectance detection of hydrogen gas using optically thin palladium film on silicon oxide | en_US |
dc.type | Article | en_US |
dc.affiliation | University of Cyprus | en |
dc.collaboration | University of Cyprus | en_US |
dc.collaboration | Linköping University | en_US |
dc.subject.category | Physical Sciences | en_US |
dc.journals | Subscription | en_US |
dc.country | Sweden | en_US |
dc.country | Cyprus | en_US |
dc.subject.field | Engineering and Technology | en_US |
dc.publication | Peer Reviewed | en_US |
dc.identifier.doi | 10.1063/1.1148787 | en_US |
dc.dept.handle | 123456789/54 | en |
dc.relation.issue | 3 | en_US |
dc.relation.volume | 69 | en_US |
cut.common.academicyear | 1998-1999 | en_US |
dc.identifier.spage | 1505 | en_US |
dc.identifier.epage | 1511 | en_US |
item.grantfulltext | none | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.fulltext | No Fulltext | - |
item.languageiso639-1 | en | - |
item.cerifentitytype | Publications | - |
item.openairetype | article | - |
crisitem.journal.journalissn | 1089-7623 | - |
crisitem.journal.publisher | American Institute of Physics | - |
crisitem.author.dept | Department of Electrical Engineering, Computer Engineering and Informatics | - |
crisitem.author.faculty | Faculty of Engineering and Technology | - |
crisitem.author.orcid | 0000-0003-4541-092X | - |
crisitem.author.parentorg | Faculty of Engineering and Technology | - |
Appears in Collections: | Άρθρα/Articles |
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