Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/1383
DC FieldValueLanguage
dc.contributor.authorChoulis, Stelios A.-
dc.contributor.authorWeinstein, Bernard A.-
dc.contributor.authorHosea, Thomas Jeff Cockburn-
dc.date.accessioned2013-03-06T16:30:57Zen
dc.date.accessioned2013-05-17T05:23:01Z-
dc.date.accessioned2015-12-02T10:18:39Z-
dc.date.available2013-03-06T16:30:57Zen
dc.date.available2013-05-17T05:23:01Z-
dc.date.available2015-12-02T10:18:39Z-
dc.date.issued2001-01-09-
dc.identifier.citationPhysica status solidi (B) Basic research, 2001, vol. 223, no. 1, pp. 151-156en_US
dc.identifier.issn15213951-
dc.identifier.urihttps://hdl.handle.net/20.500.14279/1383-
dc.description.abstractWe report photo-modulated reflectance studies under applied pressure and variable temperature, and related calculations, that probe the influence of N-related resonant anti-bonding states on the electronic structure of dilute III–N–V quantum wells (QWs). Three InyGa1—yAs1—xNx/GaAs multiple QW samples with N contents of 0–2.5% are investigated up to 85 kbar at 300 K, and for 300–10 K at 1 atm. While the temperature dependence is only minimally affected by the N content, the pressure shifts of the intersubband transition energies depend significantly on the percentage of N. The linear pressure coefficients are much smaller than those of the InGaAs band gap. A ten-band k · p model is in broad accord with the observed pressure dependence; the predicted non-linear shift is somewhat larger than measureden_US
dc.formatpdfen_US
dc.language.isoenen_US
dc.relation.ispartofPhysica status solidi (B) Basic researchen_US
dc.rights© Wileyen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/us/*
dc.subjectPressureen_US
dc.subjectTemperatureen_US
dc.subjectNitrogenen_US
dc.titleEffects of confinement on the coupling between nitrogen and band states in InGaAs1-xNx/GaAs (x ≤ 0.025) structures: pressure and temperature studiesen_US
dc.typeArticleen_US
dc.affiliationUniversity of Surreyen
dc.collaborationUniversity of Surreyen_US
dc.collaborationPhilipps-University Marburgen_US
dc.collaborationUniversity at Buffaloen_US
dc.subject.categoryMaterials Engineeringen_US
dc.journalsSubscriptionen_US
dc.countryUnited Kingdomen_US
dc.countryUnited Statesen_US
dc.countryGermanyen_US
dc.subject.fieldEngineering and Technologyen_US
dc.publicationPeer Revieweden_US
dc.identifier.doi10.1002/1521-3951(200101)223:1<151::AID-PSSB151>3.0.CO;2-Een_US
dc.dept.handle123456789/54en
dc.relation.issue1en_US
dc.relation.volume223en_US
cut.common.academicyear2001-2002en_US
dc.identifier.spage151en_US
dc.identifier.epage156en_US
item.fulltextNo Fulltext-
item.cerifentitytypePublications-
item.grantfulltextnone-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.openairetypearticle-
item.languageiso639-1en-
crisitem.journal.journalissn1521-3951-
crisitem.journal.publisherWiley-
crisitem.author.deptDepartment of Mechanical Engineering and Materials Science and Engineering-
crisitem.author.facultyFaculty of Engineering and Technology-
crisitem.author.orcid0000-0002-7899-6296-
crisitem.author.parentorgFaculty of Engineering and Technology-
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