Please use this identifier to cite or link to this item:
https://hdl.handle.net/20.500.14279/1361
Title: | Glassy quasithermal distribution of local geometries and defects in quenched amorphous silicon | Authors: | Tersoff, Jerry Kelires, Pantelis C. |
Major Field of Science: | Engineering and Technology | Field Category: | Mechanical Engineering | Keywords: | Geometry;Silicon;Temperature;Energy | Issue Date: | 1988 | Source: | Physical Review Letters, 1988, Vol. 61, Iss.5, Pp.562-565 | Volume: | 61 | Issue: | 5 | Start page: | 562 | End page: | 565 | Journal: | Physical review letters | Abstract: | Simulations of amorphous silicon formed by quenching of the liquid indicate that a-Si has a Boltzmann-like distribution of local geometries, corresponding to a "glass temperature" of roughly 700 K. The resulting tetrahedral network exhibits native defects, threefold- and fivefold-coordinated atoms, which have mean formation energies of 0.6 and 0.3 eV, respectively, and which are apparently mobile even at fairly low temperatures. These results are obtained by a novel approach to the analysis, and are relatively insensitive to the empirical interatomic potential used in the simulations. | URI: | https://hdl.handle.net/20.500.14279/1361 | ISSN: | 10797114 | DOI: | 10.1103/PhysRevLett.61.562 | Rights: | © The American Physical Society. | Type: | Article | Affiliation: | Thomas J. Watson Research Center, New York | Affiliation : | T.J. Watson Research Center | Publication Type: | Peer Reviewed |
Appears in Collections: | Άρθρα/Articles |
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