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|Title:||Clotho: Proactive wearout deceleration in Chip-Multiprocessor interconnects||Authors:||Vitkovskiy, Arseniy
Gratz, Paul V.
|Keywords:||Human computer interaction;Transistors;Routing;Stress;Electromigration;Correlation;Integrated circuit interconnections||Category:||Electrical Engineering - Electronic Engineering - Information Engineering||Field:||Engineering and Technology||Issue Date:||14-Dec-2015||Publisher:||Institute of Electrical and Electronics Engineers Inc.||Source:||33rd IEEE International Conference on Computer Design, ICCD 2015; New York City; United States; 18- 21 October 2015||Conference:||IEEE International Conference on Computer Design, ICCD||Abstract:||With advancing process technology, Chip-Multiprocessors (CMPs) are experiencing ever worsening reliability due to prolonged operational stresses. The network-on-chip that interconnects the components of CMPs is especially vulnerable to such wearout-induced failure. To tackle this ominous threat we present Clotho, a novel, wearout-Aware routing algorithm. Clotho continuously considers the stresses the on-chip interconnect experiences at runtime, along with temperature and fabrication process variation metrics, steering traffic away from locations that are most prone to Electromigration (EM)-and Hot-Carrier Injection (HCI)-induced wear. Under realistic workloads Clotho yields 66% and 8% average increases in mean time to failure for EM and HCI, respectively.||ISBN:||978-146737165-0||DOI:||10.1109/ICCD.2015.7357092||Rights:||© 2015 IEEE.||Type:||Conference Papers|
|Appears in Collections:||Δημοσιεύσεις σε συνέδρια/Conference papers|
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