Please use this identifier to cite or link to this item: https://ktisis.cut.ac.cy/handle/10488/7407
Title: Nondestructive evaluation of metal contaminated silicon wafers using radiometric measurements
Authors: Kalli, Kyriacos 
Christofidès, Constantinos 
Othonos, Andreas S. 
Tardiff, F. 
Major Field of Science: Engineering and Technology
Field Category: Electrical Engineering - Electronic Engineering - Information Engineering
Keywords: Semiconductor doping;Silicon;Surface contamination;Nondestructive testing;Photothermal spectroscopy
Issue Date: Sep-1999
Source: Journal of Applied Physics,1999, vol. 86, no. 6, pp. 3064-3067
Volume: 86
Issue: 6
Start page: 3064
End page: 3067
Journal: Journal of Applied Physics 
Abstract: Metal contaminated silicon wafers were examined using nondestructive methods based on photothermal radiometry. This approach relies on measuring the blackbody radiation emitted from a material excited by a modulated laser source. Information is recovered regarding the electronic and thermal properties of the semiconductor as a function of laser modulation frequency. Data collected as a function of modulation frequency and time show clear distinctions between different samples. The sensitivity to different forms of metallic contamination is examined.
ISSN: 1089-7550
DOI: 10.1063/1.371168
Rights: © American Institute of Physics.
Type: Article
Affiliation : University of Cyprus 
LETI (CEA - Technologies Avancées) 
Appears in Collections:Άρθρα/Articles

CORE Recommender
Show full item record

SCOPUSTM   
Citations

1
checked on Jun 23, 2021

WEB OF SCIENCETM
Citations

2
Last Week
0
Last month
0
checked on Apr 22, 2021

Page view(s)

173
Last Week
1
Last month
7
checked on Jun 25, 2021

Google ScholarTM

Check

Altmetric


Items in KTISIS are protected by copyright, with all rights reserved, unless otherwise indicated.