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|Title:||Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen||Authors:||Kalli, Kyriacos
Othonos, Andreas S.
|Keywords:||Atomic force microscopy;Hydrogen;Nanostructured materials;Refractive index;Refractive index||Category:||Electrical Engineering - Electronic Engineering - Information Engineering||Field:||Engineering and Technology||Issue Date:||1-Jul-2000||Publisher:||Elsevier||Source:||Applied Surface Science, 2000, vol. 161, no. 1, pp. 54-60||Journal:||Applied Surface Science||Abstract:||Optically thin palladium films evaporated on different silicon-based substrates are investigated following exposure to different concentrations of hydrogen gas in air. Laser modulated reflectance off the palladium surface of silicon oxide, silicon nitrite and polycrystalline silicon substrates is used to recover information regarding changes in optical properties of the samples due to the absorption of hydrogen. Simple index of refraction arguments are sufficient to explain the results. Structural changes of the palladium films have been investigated using atomic force microscopy before and after hydrogen exposure. An interesting nanostructure formation is evident in some of the samples, leading to a possible means of fabricating nanodevices.||ISSN:||0169-4332||DOI:||10.1016/S0169-4332(00)00140-9||Rights:||© 2000 Elsevier B.V. All rights reserved.||Type:||Article|
|Appears in Collections:||Άρθρα/Articles|
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