Please use this identifier to cite or link to this item: https://ktisis.cut.ac.cy/handle/10488/7323
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dc.contributor.authorMatenoglou, G. M.-
dc.contributor.authorPatsalas, Panos-
dc.contributor.authorKoutsokeras, Loukas E.-
dc.contributor.otherΚουτσοκέρας, Λουκάς Ε.-
dc.date.accessioned2013-02-21T13:51:18Zen
dc.date.accessioned2013-05-17T10:30:24Z-
dc.date.accessioned2015-12-09T12:08:12Z-
dc.date.available2013-02-21T13:51:18Zen
dc.date.available2013-05-17T10:30:24Z-
dc.date.available2015-12-09T12:08:12Z-
dc.date.issued2013-01-15-
dc.identifier.citationThin solid films, 2013, vol. 528, pp. 49-52en_US
dc.identifier.issn0040-6090-
dc.description.abstractWe present a thorough and critical study of the electronic properties of the mononitrides of the group IV-V-VI metals (TiN, ZrN, HfN, NbN, TaN, MoN, and WN) grown by Pulsed Laser Deposition (PLD). The microstructure and density of the films have been studied by X-Ray Diffraction (XRD) and Reflectivity (XRR), while their optical properties were investigated by spectral reflectivity at vertical incidence and in-situ reflection electron energy loss spectroscopy (R-EELS). We report the R-EELS spectra for all the binary TMN and we identify their features (metal-d plasmon and N-p + metal-d loss) based on previous ab-initio band structure calculations. The spectral positions of p + d loss peak are rationally grouped according to the electron configuration (i.e. of the respective quantum numbers) of the constituent metal. The assigned and reported R-EELS spectra can be used as a reference database for the colloquial in-situ surface analysis performed in most laboratoriesen_US
dc.formatpdfen_US
dc.language.isoenen_US
dc.publisherElsevieren
dc.relation.ispartofThin Solid Filmsen_US
dc.rights© Elsevieren_US
dc.subjectMaterials scienceen_US
dc.subjectNitridesen_US
dc.subjectMicrostructureen_US
dc.subjectTransition metal nitridesen_US
dc.subjectTitanium nitrideen_US
dc.subjectTransition metalsen_US
dc.titleStructure, electronic properties and electron energy loss spectra of transition metal nitride filmsen_US
dc.typeArticleen_US
dc.collaborationUniversity of Ioanninaen_US
dc.subject.categoryMaterials Engineeringen_US
dc.journalsSubscriptionen_US
dc.reviewpeer reviewed-
dc.countryGreeceen_US
dc.subject.fieldEngineering and Technologyen_US
dc.publicationPeer Revieweden_US
dc.identifier.doi10.1016/j.tsf.2012.06.086en_US
dc.dept.handle123456789/141en
dc.relation.volume528en_US
cut.common.academicyear2013-2014en_US
dc.identifier.spage49en_US
dc.identifier.epage52en_US
item.cerifentitytypePublications-
item.fulltextNo Fulltext-
item.grantfulltextnone-
item.languageiso639-1en-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.openairetypearticle-
crisitem.journal.journalissn0040-6090-
crisitem.journal.publisherElsevier-
crisitem.author.deptDepartment of Mechanical Engineering and Materials Science and Engineering-
crisitem.author.facultyFaculty of Engineering and Technology-
crisitem.author.orcid0000-0003-4143-0085-
crisitem.author.parentorgFaculty of Engineering and Technology-
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