Please use this identifier to cite or link to this item: https://ktisis.cut.ac.cy/handle/10488/7323
Title: Structure, electronic properties and electron energy loss spectra of transition metal nitride films
Authors: Matenoglou, G. M. 
Patsalas, Panos 
Koutsokeras, Loukas E. 
Major Field of Science: Engineering and Technology
Field Category: Materials Engineering
Keywords: Materials science;Nitrides;Microstructure;Transition metal nitrides;Titanium nitride;Transition metals
Issue Date: 15-Jan-2013
Source: Thin solid films, 2013, vol. 528, pp. 49-52
Volume: 528
Start page: 49
End page: 52
Journal: Thin Solid Films 
Abstract: We present a thorough and critical study of the electronic properties of the mononitrides of the group IV-V-VI metals (TiN, ZrN, HfN, NbN, TaN, MoN, and WN) grown by Pulsed Laser Deposition (PLD). The microstructure and density of the films have been studied by X-Ray Diffraction (XRD) and Reflectivity (XRR), while their optical properties were investigated by spectral reflectivity at vertical incidence and in-situ reflection electron energy loss spectroscopy (R-EELS). We report the R-EELS spectra for all the binary TMN and we identify their features (metal-d plasmon and N-p + metal-d loss) based on previous ab-initio band structure calculations. The spectral positions of p + d loss peak are rationally grouped according to the electron configuration (i.e. of the respective quantum numbers) of the constituent metal. The assigned and reported R-EELS spectra can be used as a reference database for the colloquial in-situ surface analysis performed in most laboratories
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2012.06.086
Rights: © Elsevier
Type: Article
Affiliation : University of Ioannina 
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