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Title: Room-Temperature-Sputtered Nanocrystalline Nickel Oxide as Hole Transport Layer for p-i-n Perovskite Solar Cells
Authors: Schwingenschlögl, Udo 
De Wolf, Stefaan 
Laquai, Frédéric
Aydin, Erkan 
Troughton, Joel 
Neophytou, Marios 
Baran, Derya
De Bastiani, Michele 
Ugur, Esma 
Sajjad, Muhammad 
Alzahrani, Areej 
Keywords: Plastic optical fibers;Microstructured polymer;Bragg gratings
Category: Mechanical Engineering;Materials Engineering
Field: Engineering and Technology
Issue Date: 26-Nov-2018
Source: Japanese Journal of Applied Physics, Volume 58, Issue 2, 2019, Article number 028003
Journal: Japanese Journal of Applied Physics 
Abstract: © Copyright 2018 American Chemical Society. Nickel oxide (NiO x ) is a promising hole transport layer (HTL) for perovskite solar cells (PSCs), as it combines good chemical stability, high broadband optical transparency, and a high work function. Excellent power conversion efficiencies (PCEs) have already been reported using solution-processed NiO x . However, solution-based techniques usually require high-temperature postannealing to achieve the required HTL properties of NiO x , which jeopardizes its use for many applications, such as monolithic tandem solar cells. To resolve this issue, we developed room-temperature-sputtered NiO x and demonstrated p-i-n PSCs with 17.6% PCE (with negligible hysteresis), which are comparable to the best PSCs using sputtered and annealed NiO x without heteroatom doping. Through detailed characterization and density functional theory (DFT) analysis, we explored the electrical and optical properties of the obtained NiO x films and find that they are strongly linked with the specific defect chemistry of this material. Finally, in view of its use in perovskite/silicon tandem solar cells, we find that direct sputtering on random-pyramid textured silicon wafers results in highly conformal NiO x films.
ISSN: 00214922
DOI: 10.1021/acsaem.8b01263
Type: Article
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