Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14279/18166
DC FieldValueLanguage
dc.contributor.authorLaquai, Fŕd́ric-
dc.contributor.authorKeivanidis, Panagiotis E.-
dc.contributor.authorBaluschev, Stanislav-
dc.contributor.authorJacob, Josemon-
dc.contributor.authorMüllen, Klaus-
dc.contributor.authorWegner, Gerhard-
dc.date.accessioned2020-03-26T19:55:56Z-
dc.date.available2020-03-26T19:55:56Z-
dc.date.issued2005-12-01-
dc.identifier.citationApplied Physics Letters, 2005, vol. 87, iss. 26, pp. 1-3en_US
dc.identifier.issn00036951-
dc.identifier.urihttps://hdl.handle.net/20.500.14279/18166-
dc.descriptionFunding text The authors acknowledge financial support by the German Ministry of Science and Education, Project OLAS, 13N8168. One of the authors (F.L.) wishes to thank the Fonds der Chemischen Industrie for providing a Kekulé scholarship. The authors acknowledge experimental assistance from H. Menges.en_US
dc.description.abstractWe report on amplification of blue light (469 nm) via amplified spontaneous emission in asymmetric planar waveguides of a fully arylated polyindenofluorene derivative. A very low threshold value of about 3 μJ cm2 (∼375 W cm2) for amplification of light has been demonstrated by pumping the waveguides at 3.0 eV (410 nm) with a stripe shape excitation beam. Moderate gain coefficients up to 21 cm-1 and loss coefficients around 6 cm-1 have been measured. All measurements were performed under ambient conditions. No sample degradation could be observed which testifies to the excellent stability of the material against photodegradation. © 2005 American Institute of Physics.en_US
dc.formatpdfen_US
dc.language.isoenen_US
dc.relation.ispartofApplied Physics Lettersen_US
dc.rights© American Institute of Physics.en_US
dc.titleLow-threshold amplified spontaneous emission in thin films of poly(tetraarylindenofluorene)en_US
dc.typeArticleen_US
dc.collaborationMax Planck Instituteen_US
dc.subject.categoryMechanical Engineeringen_US
dc.journalsSubscriptionen_US
dc.countryGermanyen_US
dc.subject.fieldEngineering and Technologyen_US
dc.publicationPeer Revieweden_US
dc.identifier.doi10.1063/1.2158508en_US
dc.identifier.scopus2-s2.0-29744450722-
dc.identifier.urlhttps://api.elsevier.com/content/abstract/scopus_id/29744450722-
dc.relation.issue26en_US
dc.relation.volume87en_US
cut.common.academicyear2005-2006en_US
dc.identifier.spage1en_US
dc.identifier.epage3en_US
item.grantfulltextnone-
item.cerifentitytypePublications-
item.fulltextNo Fulltext-
item.languageiso639-1en-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.openairetypearticle-
crisitem.author.deptDepartment of Mechanical Engineering and Materials Science and Engineering-
crisitem.author.facultyFaculty of Engineering and Technology-
crisitem.author.orcid0000-0002-5336-249X-
crisitem.author.parentorgFaculty of Engineering and Technology-
crisitem.journal.journalissn1077-3118-
crisitem.journal.publisherAmerican Institute of Physics-
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