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https://hdl.handle.net/20.500.14279/1408
Πεδίο DC | Τιμή | Γλώσσα |
---|---|---|
dc.contributor.author | Kaxiras, Efthimios | - |
dc.contributor.author | Kelires, Pantelis C. | - |
dc.contributor.other | Κελίρης, Παντελής | - |
dc.date.accessioned | 2013-03-05T12:40:46Z | en |
dc.date.accessioned | 2013-05-17T05:22:54Z | - |
dc.date.accessioned | 2015-12-02T10:12:26Z | - |
dc.date.available | 2013-03-05T12:40:46Z | en |
dc.date.available | 2013-05-17T05:22:54Z | - |
dc.date.available | 2015-12-02T10:12:26Z | - |
dc.date.issued | 1998-05 | - |
dc.identifier.citation | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures,1998, vol. 16, no. 3, pp. 1687-1691 | en_US |
dc.identifier.issn | 10711023 | - |
dc.identifier.uri | https://hdl.handle.net/20.500.14279/1408 | - |
dc.description.abstract | We discuss a set of atomistic calculations of the structure of Si geometries with substitutional carbon atoms, involving the (100) surface or bulk features related to thin films grown in the (100) direction. We use both quantum mechanical density functional theory and empirical potential calculations at r finite temperature and constant pressure to study the local structure, bonding characteristics and overall distribution of the carbon atoms in the host silicon lattice. These calculations reveal a strong nearest neighbor repulsion between substitutional carbon atoms, to the point where these atoms prefer to have fewer bonds than normally in order to avoid each other. This effect still holds for high temperatures and high carbon concentrations. As a result, bulk ordering of the type observed in Si-Ge alloys is unlikely to occur. | en_US |
dc.format | en_US | |
dc.language.iso | en | en_US |
dc.relation.ispartof | Journal of Vacuum Science and Technology B | en_US |
dc.rights | © American Vacuum Society. | en_US |
dc.subject | Silicon | en_US |
dc.subject | Carbon | en_US |
dc.subject | Semiconductors | en_US |
dc.subject | Density functionals | en_US |
dc.subject | Thin films | en_US |
dc.title | Substitutional carbon impurities in thin silicon films: equilibrium structure and properties | en_US |
dc.type | Article | en_US |
dc.affiliation | University of Crete | en |
dc.collaboration | University of Crete | en_US |
dc.collaboration | Foundation for Research & Technology-Hellas (F.O.R.T.H.) | en_US |
dc.collaboration | Harvard University | en_US |
dc.journals | Subscription | en_US |
dc.country | Greece | en_US |
dc.country | United States | en_US |
dc.subject.field | Natural Sciences | en_US |
dc.identifier.doi | 10.1116/1.590035 | en_US |
dc.dept.handle | 123456789/54 | en |
dc.relation.issue | 3 | en_US |
dc.relation.volume | 16 | en_US |
cut.common.academicyear | 1997-1998 | en_US |
dc.identifier.spage | 1687 | en_US |
dc.identifier.epage | 1691 | en_US |
item.fulltext | No Fulltext | - |
item.cerifentitytype | Publications | - |
item.grantfulltext | none | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.openairetype | article | - |
item.languageiso639-1 | en | - |
crisitem.journal.journalissn | 1071-1023 | - |
crisitem.journal.publisher | American Institute of Physics | - |
crisitem.author.dept | Department of Mechanical Engineering and Materials Science and Engineering | - |
crisitem.author.faculty | Faculty of Engineering and Technology | - |
crisitem.author.orcid | 0000-0002-0268-259X | - |
crisitem.author.parentorg | Faculty of Engineering and Technology | - |
Εμφανίζεται στις συλλογές: | Άρθρα/Articles |
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