Please use this identifier to cite or link to this item: http://ktisis.cut.ac.cy/handle/10488/9334
Title: Microstructure and nanomechanical properties of magnetron sputtered Ti − Nb films
Authors: Photiou, Demetris 
Panagiotopoulos, Nikolaos T. 
Koutsokeras, Loukas E. 
Evangelakis, Georgios Antomiou 
Constantinides, Georgios 
Keywords: Electron microscopy
Nanoindentation
Titanium alloys
X-ray diffraction
β − Ti poromechanics
Issue Date: 25-Sep-2016
Publisher: Elsevier B.V.
Source: Surface and Coatings Technology, 2016, Volume 302, Pages 310-319
Abstract: Titanium niobium (Ti − Nb) films, covering a broad spectrum of compositions, are deposited on silicon substrates using magnetron co-sputtering. The morphological, crystallographic and mechanical characteristics of the films are studied using scanning electron microscopy (SEM), X-ray diffraction (XRD) and nanoindentation, respectively. The Ti − Nb films exhibit a columnar growth and contain porosity at volumetric percentages of 2–14 vol%. Furthermore, it is observed that the allotropic β − Ti phase can be stabilized at room temperature for Nb compositions beyond 20 at%. Phase composition and microstructural details have subsequent implications on the mechanical properties of the films which are studied experimentally and micromechanically. Among the tested compositions, Ti85Nb15 exhibits the lowest elastic modulus. The obtained structure–property relations could serve as a tool for material optimization.
URI: http://ktisis.cut.ac.cy/handle/10488/9334
ISSN: 02578972
Rights: © 2016 Elsevier B.V.
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