Please use this identifier to cite or link to this item: http://ktisis.cut.ac.cy/handle/10488/7335
Title: Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen
Authors: Kalli, Kyriacos 
Othonos, Andreas S. 
Tsai, DinPing
Keywords: Atomic force microscopy
Hydrogen
Nanostructured materials
Refractive index
Refractive index
Issue Date: 2000
Publisher: Elsevier
Source: Applied Surface Science,2000, Volume 161, Issue 1, Pages 54-60
Abstract: Optically thin palladium films evaporated on different silicon-based substrates are investigated following exposure to different concentrations of hydrogen gas in air. Laser modulated reflectance off the palladium surface of silicon oxide, silicon nitrite and polycrystalline silicon substrates is used to recover information regarding changes in optical properties of the samples due to the absorption of hydrogen. Simple index of refraction arguments are sufficient to explain the results. Structural changes of the palladium films have been investigated using atomic force microscopy before and after hydrogen exposure. An interesting nanostructure formation is evident in some of the samples, leading to a possible means of fabricating nanodevices.
URI: http://ktisis.cut.ac.cy/handle/10488/7335
http://172.16.21.12:8080/jspui/handle/10488/7335
http://hdl.handle.net/10488/7335
ISSN: 0169-4332
DOI: 10.1016/S0169-4332(00)00140-9
Rights: © 2000 Elsevier B.V. All rights reserved.
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