Please use this identifier to cite or link to this item:
Title: Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen
Authors: Kalli, Kyriacos 
Othonos, Andreas S. 
Tsai, DinPing
Keywords: Atomic force microscopy;Hydrogen;Nanostructured materials;Refractive index;Refractive index
Issue Date: 2000
Publisher: Elsevier
Source: Applied Surface Science,2000, Volume 161, Issue 1, Pages 54-60
Abstract: Optically thin palladium films evaporated on different silicon-based substrates are investigated following exposure to different concentrations of hydrogen gas in air. Laser modulated reflectance off the palladium surface of silicon oxide, silicon nitrite and polycrystalline silicon substrates is used to recover information regarding changes in optical properties of the samples due to the absorption of hydrogen. Simple index of refraction arguments are sufficient to explain the results. Structural changes of the palladium films have been investigated using atomic force microscopy before and after hydrogen exposure. An interesting nanostructure formation is evident in some of the samples, leading to a possible means of fabricating nanodevices.
ISSN: 0169-4332
Rights: © 2000 Elsevier B.V. All rights reserved.
Type: Article
Appears in Collections:Άρθρα/Articles

Show full item record


checked on Feb 13, 2018

Page view(s)

Last Week
Last month
checked on Jan 21, 2019

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.