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|Title:||Structure, electronic properties and electron energy loss spectra of transition metal nitride films||Authors:||Matenoglou, G. M.
Koutsokeras, Loukas E.
|Keywords:||Materials science;Nitrides;Microstructure;Transition metal nitrides;Titanium nitride;Transition metals||Category:||Materials Engineering||Field:||Engineering and Technology||Issue Date:||2013||Publisher:||Elsevier||Source:||Thin solid films, 2013, Volume 528, Pages 49-52||Abstract:||We present a thorough and critical study of the electronic properties of the mononitrides of the group IV-V-VI metals (TiN, ZrN, HfN, NbN, TaN, MoN, and WN) grown by Pulsed Laser Deposition (PLD). The microstructure and density of the films have been studied by X-Ray Diffraction (XRD) and Reflectivity (XRR), while their optical properties were investigated by spectral reflectivity at vertical incidence and in-situ reflection electron energy loss spectroscopy (R-EELS). We report the R-EELS spectra for all the binary TMN and we identify their features (metal-d plasmon and N-p + metal-d loss) based on previous ab-initio band structure calculations. The spectral positions of p + d loss peak are rationally grouped according to the electron configuration (i.e. of the respective quantum numbers) of the constituent metal. The assigned and reported R-EELS spectra can be used as a reference database for the colloquial in-situ surface analysis performed in most laboratories||URI:||http://ktisis.cut.ac.cy/handle/10488/7323||ISSN:||0040-6090||DOI:||http://dx.doi.org/10.1016/j.tsf.2012.06.086||Rights:||© 2012 Elsevier B.V. All rights reserved||Type:||Article|
|Appears in Collections:||Άρθρα/Articles|
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